The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Aug. 20, 2004
Applicants:
Richard W. Siegel, Menands, NY (US);
Linda Schadler-feist, Niskayuna, NY (US);
Dongling MA, Ottawa, CA;
Jung-il Hong, San Diego, CA (US);
Eva Martensson, Vasteras, SE;
Carina Onneby, Vasteras, SE;
Inventors:
Richard W. Siegel, Menands, NY (US);
Linda Schadler-Feist, Niskayuna, NY (US);
Dongling Ma, Ottawa, CA;
Jung-Il Hong, San Diego, CA (US);
Eva Martensson, Vasteras, SE;
Carina Onneby, Vasteras, SE;
Assignee:
Rensselaer Polytechnic Institute, Troy, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08K 3/18 (2006.01);
U.S. Cl.
CPC ...
Abstract
A field grading material includes a field grading effective amount of a nanoparticle filler distributed in a polymeric matrix, and the nanoparticle filler is heterogeneously distributed in the polymeric matrix.