The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Jan. 26, 2006
Elizabeth Walker, Stockertown, PA (US);
Shahri Naghshineh, Allentown, PA (US);
Jeffrey A. Barnes, Bath, PA (US);
Ewa Oldak, Bethlehem, PA (US);
Darryl W. Peters, Stewartsville, NJ (US);
Kevin P. Yanders, Germansville, PA (US);
Elizabeth Walker, Stockertown, PA (US);
Shahri Naghshineh, Allentown, PA (US);
Jeffrey A. Barnes, Bath, PA (US);
Ewa Oldak, Bethlehem, PA (US);
Darryl W. Peters, Stewartsville, NJ (US);
Kevin P. Yanders, Germansville, PA (US);
Advanced Technology Materials, Inc., Danbury, CT (US);
Abstract
Compositions useful in microelectronic device manufacturing for surface preparation and/or cleaning of wafer substrates such as microelectronic device precursor structures. The compositions can be employed for processing of wafers that have, or are intended to be further processed to include, copper metallization, e.g., in operations such as surface preparation, pre-plating cleaning, post-etching cleaning, and post-chemical mechanical polishing cleaning of microelectronic device wafers. The compositions contain (i) alkanolamine, (ii) quaternary ammonium hydroxide and (iii) a complexing agent, and are storage-stable, as well as non-darkening and degradation-resistant in exposure to oxygen.