The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
May. 31, 2006
Applicants:
Fumitaka Takemura, Higashichikuma, JP;
Tomoe Yamazaki, Sendai, JP;
Yosuke Kobayashi, Sendai, JP;
Tsutomu Tanaka, Sendai, JP;
Inventors:
Fumitaka Takemura, Higashichikuma, JP;
Tomoe Yamazaki, Sendai, JP;
Yosuke Kobayashi, Sendai, JP;
Tsutomu Tanaka, Sendai, JP;
Assignee:
Future Vision Inc., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B05C 5/02 (2006.01); B05D 3/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
A pattern forming apparatus comprises a surface treatment system and an ink jet system, where a solvent is sprayed from a solvent spray nozzle of the surface treatment system to surface of a glass substrate where a bus line pattern groove is formed. The ink is discharged from an ink discharge nozzle of the ink jet system into the groove of bus line pattern on a glass substrate, and a bus line pattern is formed.