The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2011

Filed:

Sep. 05, 2008
Applicant:

Yutaka Furukawa, Tokyo, JP;

Inventor:

Yutaka Furukawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 33/00 (2006.01); B32B 17/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A treated substrate having a hydrophilic region and a water repellent region, of which contrast is high on its surface; a process for producing a treated substrate, wherein the treated substrate can be produced with a low amount of light for a short time; wherein the water repellent region is made of a water repellent film formed by curing the composition (A) comprising a photopolymerization initiator and a compound (a) having at least one (meth)acryloyl group, and a water repellent moiety and having a film thickness of from 0.1 to 100 nm; the process uses a hydrophilic substrate or makes the surface thereof hydrophilic, then forms a film containing the composition (A) on the surface, then forms said water repellent film by irradiating light on a part of the film surface to cure the composition (A) and then removes an uncured composition (A) present thereon in order to expose the hydrophilic surface.


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