The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2011
Filed:
Jan. 31, 2006
Ki-choul an, HwaSeong, KR;
Young-chul Joung, Suwon, KR;
Tae-young Ha, HwaSeong, KR;
Jung-won Chang, DaeGu Metropolitan, KR;
Il-ho Noh, SeongNam, KR;
Seung-bae Lee, Suwon, KR;
Ki-Choul An, HwaSeong, KR;
Young-Chul Joung, Suwon, KR;
Tae-Young Ha, HwaSeong, KR;
Jung-Won Chang, DaeGu Metropolitan, KR;
Il-Ho Noh, SeongNam, KR;
Seung-Bae Lee, Suwon, KR;
Semes Co., Ltd., Chungcheongnam-do, KR;
Abstract
In a substrate processing apparatus for forming thin layers on a substrate used for an organic light emitting diode, the apparatus includes a mask attaching chamber, a deposition chamber and a mask detaching chamber. The mask attaching chamber, the deposition chamber and the mask detaching chamber are provided with a transferring guide installed thereinside, and a substrate supporter for supporting the substrate moves along the transferring guide in or between the chambers. Thus, a time for processing the substrate and an area for the apparatus may be reduced. Also, the chambers are grouped in one or more, and a gate valve is installed between the grouped chambers for opening and closing a path between the grouped chambers. Accordingly, the chambers may be continuously maintained in a vacuum state when any one of the chambers is repaired.