The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2011

Filed:

Aug. 02, 2004
Applicants:

Vera Cherepinsky, Sandy Hook, CT (US);

Bhubaneswar Mishra, Great Neck, NY (US);

Inventors:

Vera Cherepinsky, Sandy Hook, CT (US);

Bhubaneswar Mishra, Great Neck, NY (US);

Assignee:

New York University, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 33/48 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates generally to systems, methods, storage media, and software arrangements for genotyping and/or haplotyping a sequence of polymorphic genetic loci in a deoxyribonucleic acid (DNA) sample or identifying a strain variant from the DNA sample. Exemplary embodiments of systems, methods, storage media, and software arrangements may perform the optimization of the design of one or more microarrays, each containing a set of oligonucleotide probes capable of detecting one or more known genotypes and/or haplotypes at given polymorphic genetic loci or identifying the strain variant, by optimizing the set of oligonucleotides to be incorporated into the microarrays and by optimizing the arrangement of a set of oligonucleotides on the microarrays. The optimization may be achieved through the application of one or more optimization procedures. The instant invention may be useful in typing individuals at the HLA loci or other polymorphic genetic loci, or may be employed to quickly identify viral or bacterial pathogens from which genome sequence information is available.


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