The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2011

Filed:

Apr. 15, 2008
Applicant:

Hung M. Pham, Torrance, CA (US);

Inventor:

Hung M. Pham, Torrance, CA (US);

Assignee:

Xerox Corporation, Norwalk, CT (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 1/405 (2006.01);
U.S. Cl.
CPC ...
Abstract

What is disclosed is a novel system and method for minimizing visual artifacts, such as ROS skew and laserbeam bow, in a brick-layer halftone structure. The present method involves determining a line pattern from ROS skew and laserbeam bow profiles which traverses through successive halftone cells displacing pixels along scanlines in the process direction. The amount of displacement is varied as a function of the cross-process location as determined by the line pattern. Pixels along scanlines are shifted in a direction defined by the error profiles. In each halftone cell within which the line pattern traverses, extra pixels (empty pixel spaces created in the halftone cell by the shifting operation) are filled with lost pixels (pixels bumped from the halftone cell during the shifting operation) such that overall density of the halftone cell is maintained. The lost pixels are buffered such that lost pixels are preserved.


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