The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2011
Filed:
Dec. 10, 2007
Applicants:
Kuo-yao Cho, Taipei, TW;
Wen-bin Wu, Taipei, TW;
Chiang-lin Shih, Yunlin, TW;
Jen-jui Huang, Yunlin, TW;
Inventors:
Kuo-Yao Cho, Taipei, TW;
Wen-Bin Wu, Taipei, TW;
Chiang-Lin Shih, Yunlin, TW;
Jen-Jui Huang, Yunlin, TW;
Assignee:
Nanya Technology Corp., Taiwan, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a ring-type capacitor is provided. The method includes providing a substrate; forming a patterned mask layer on the substrate, the patterned mask layer defining a ring pattern; removing the substrate by using the patterned mask layer as a mask to form a ring-type trench in the substrate; the ring-type trench including an inner wall and an outer wall; and forming a capacitor structure on the inner wall and the outer wall of the ring-type trench.