The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2011
Filed:
Nov. 29, 2007
Applicant:
Ayato Imai, Tokyo, JP;
Inventor:
Ayato Imai, Tokyo, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 29/393 (2006.01);
U.S. Cl.
CPC ...
Abstract
In multipass printing, a mask pattern which increases the degree of dot dispersion in each pass is used for a combination of inks for increasing glossiness when printing an image. Contrary, a mask pattern which decreases the degree of dot dispersion in each pass is used for a combination of inks for decreasing glossiness. Thus, an entire image can be made uniformly glossy by suppressing gloss unevenness within the image.