The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2011
Filed:
Jan. 28, 2009
Hiroki Yamamoto, Kamakura, JP;
Masamitsu Itoh, Yokohama, JP;
Osamu Ikenaga, Yokohama, JP;
Shoji Mimotogi, Yokohama, JP;
Hideki Kanai, Wappingers Falls, NY (US);
Yukiyasu Arisawa, Tsukuba, JP;
Hiroki Yamamoto, Kamakura, JP;
Masamitsu Itoh, Yokohama, JP;
Osamu Ikenaga, Yokohama, JP;
Shoji Mimotogi, Yokohama, JP;
Hideki Kanai, Wappingers Falls, NY (US);
Yukiyasu Arisawa, Tsukuba, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A method of evaluating a photo mask, includes measuring each dimension of a plurality of pattern portions of a mask pattern formed on a photo mask, obtaining an inter-pattern distance between the pattern portion and a pattern different from the pattern portion with respect to each of the pattern portions, obtaining a dimensional difference between the measured dimension of the pattern portion and a target dimension of the pattern portion with respect to each of the pattern portions, grouping the dimensional difference obtained for each pattern portion into a plurality of groups in accordance with the inter-pattern distance obtained for each pattern portion, obtaining an evaluation value based on the dimensional difference in each group with respect to each of the groups, and evaluating the photo mask based on the evaluation value.