The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2011
Filed:
Oct. 21, 2005
Applicant:
Yasuyuki Unno, Irvine, CA (US);
Inventor:
Yasuyuki Unno, Irvine, CA (US);
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 9/00 (2006.01); G02B 9/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
At least one exemplary embodiment is directed to a detection aperture that varies the effective aperture index of refraction or provides scattering structures to improve the detected resolution and/or intensity of a sampled image. In at least one exemplary embodiment a medium is inserted into the aperture, to match transmittance of polarization through the aperture, and to control the relative transmittance of polarizations through the aperture. In yet another exemplary embodiment structures are provided to scatter or redirect diffracted aperture light to improve detection resolution and/or intensity.