The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2011
Filed:
Jun. 25, 2009
Byung Soo Eun, Seoul, KR;
Byung Soo Eun, Seoul, KR;
Hynix Semiconductor Inc., Icheon-si, KR;
Abstract
Disclosed herein is a method for insulating wires of a semiconductor device. One embodiment of the method includes forming first bit line stacks over a cell region of a semiconductor substrate and second bit line stacks over a peripheral region of the semiconductor substrate, and forming a Spin On Dielectric (SOD) layer to fill between the first and second bit line stacks. The method also includes etching back the SOD layer to expose upper side portions of the first and second bit line stacks, selectively removing a portion of the SOD layer present on the peripheral region, and depositing a High Density Plasma (HDP) insulation layer to cover a portion of the SOD layer present on the cell region, and to fill between the second bit line stacks present on the peripheral region.