The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2011
Filed:
Apr. 25, 2007
Joanne Liu, Reading, MA (US);
Yakov E. Kutsovsky, Arlington, MA (US);
George P. Fotou, Albuquerque, NM (US);
Joanne Liu, Reading, MA (US);
Yakov E. Kutsovsky, Arlington, MA (US);
George P. Fotou, Albuquerque, NM (US);
Cabot Corporation, Boston, MA (US);
Abstract
The invention provides a process for the production of fumed silica. The process comprises providing a silicon halide feedstock comprising about 80% to 100% methyltrichlorosilane, combining the silicon halide feedstock with hydrogen gas and oxygen gas to form a reactant mixture, discharging the reactant mixture out of a burner, and combusting the hydrogen gas and the oxygen gas of the reactant mixture so as to hydrolyze the silicon halide feedstock to produce fumed silica. Hydrogen (H) is present in a mole fraction of about 0.11 or less based on the reactant mixture, and/or the velocity of the reactant mixture upon exiting the burner is about 25 m/s or more.