The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
Jun. 25, 2008
Baskar Sridharan, Sammamish, WA (US);
Abdelsalam A. Heddaya, Bellevue, WA (US);
Jonathan D. Morrison, North Bend, WA (US);
Mujtaba S. Khambatti, Sammamish, WA (US);
Anthony J. Lorelli, Kirkland, WA (US);
Tristan P. K. Schmelcher, Kirkland, WA (US);
Baskar Sridharan, Sammamish, WA (US);
Abdelsalam A. Heddaya, Bellevue, WA (US);
Jonathan D. Morrison, North Bend, WA (US);
Mujtaba S. Khambatti, Sammamish, WA (US);
Anthony J. Lorelli, Kirkland, WA (US);
Tristan P. K. Schmelcher, Kirkland, WA (US);
Microsoft Corporation, Redmond, WA (US);
Abstract
Process reflection techniques are described in which a reflected process is created to facilitate analysis of a process. Events are detected to initiate reflection of a target process. Process reflection of a target process may be initiated by an external process or by the target process itself. A reflected process of the target process is created. In an implementation, data defining the target process is replicated, copied, or otherwise collected from the target process to create the reflected process. Then, analysis may be performed on the reflected process while execution of the target process continues.