The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
Nov. 26, 2008
Applicants:
Noam Meir, Hezlia, IL;
Micha Zimmermann, Haifa, IL;
Yosi Shani, Maccabim, IL;
Inventors:
Assignee:
Oree, Inc., Ramat Gan, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/26 (2006.01); G02F 1/13357 (2006.01); F21V 8/00 (2006.01); F21V 7/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
In one aspect, a planar illumination area includes two light-guide elements, each with an out-coupling region. At least a portion of each out-coupling region overlaps with at least a portion of the other. The overlapping region emits a substantially uniform light output power.
Meir, Noam. (2011). Elimination of stitch artifacts in a planar illumination area (U.S. Patent No. 7907804). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7907804
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