The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
Aug. 31, 2007
Mitsuo Sakurai, Kawasaki, JP;
Takahisa Itoh, Kawasaki, JP;
Taketoshi Omata, Kawasaki, JP;
Kenji Chichii, Kawasaki, JP;
Mitsuo Sakurai, Kawasaki, JP;
Takahisa Itoh, Kawasaki, JP;
Taketoshi Omata, Kawasaki, JP;
Kenji Chichii, Kawasaki, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
A pattern data processing method comprising, obtaining pattern data on a mask pattern, determining whether a processing time for the mask pattern in a processing software is reduced by rotating the mask pattern by a predetermined angle than a case where the mask pattern is processed in the processing software without being rotated, obtaining pattern data on a rotated pattern formed by rotating the mask pattern by the predetermined angle in the case that the processing time is reduced, processing the pattern data on the rotated pattern by using the processing software, and causing the mask pattern to return to its original direction.