The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
Oct. 26, 2007
Shaowei Wang, Shanghai, CN;
Wei LU, Shanghai, CN;
Xiaoshuang Chen, Shanghai, CN;
Ning LI, Shanghai, CN;
BO Zhang, Shanghai, CN;
Zhifeng LI, Shanghai, CN;
Pingping Chen, Shanghai, CN;
Shaowei Wang, Shanghai, CN;
Wei Lu, Shanghai, CN;
Xiaoshuang Chen, Shanghai, CN;
Ning Li, Shanghai, CN;
Bo Zhang, Shanghai, CN;
Zhifeng Li, Shanghai, CN;
Pingping Chen, Shanghai, CN;
Abstract
Taught herein is an integragted narrow bandpass filter array and a method of its fabrication. The filter array is a Fabry-Perot type of filter array, wherein the pass band changes with the thickness of the spacer layer. The integrated filter array comprises a substrate, a lower mirror stack, a spacer array, and an upper mirror stack. The spacer array is an array of varied thicknesses formed using a combinatorial deposition technique. The spacer array is used to control the pass band of each mini-size narrow bandpass filter and realizes the integration of narrow bandpass filters with different pass bands on a single substrate. The merit of this technique lies in its fabrication efficiency and finished product rate which are much higher than for conventional methods. The filter array is completely matched with detector arrays and functional in most of the important optical ranges.