The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
Mar. 25, 2010
Yoshihiko Fujimori, Yokohama, JP;
Yuji Kudo, Tokyo, JP;
Yoshihiko Fujimori, Yokohama, JP;
Yuji Kudo, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A surface inspection method inspects a surface of a wafer having a repeated pattern formed by double patterning. The method includes: a first step (S) which applies an inspection light to a surface of a wafer; a second step (S) which detects a diffracted light from the surface of the wafer to which the inspection light has been applied; and a third step (S) which checks whether a defect is present in the repeated pattern according to the diffracted light detected in the second step. The second step detects a diffracted light corresponding to a pattern having a pitch multiplied by 2 with respect to the pitch of the repeated pattern.