The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
Mar. 21, 2006
Chun-jen Liao, Taipei, TW;
Yung-chih Wu, Taipei County, TW;
Chen-chi Tsai, Taipei County, TW;
Hsiang-ming Huang, Taipei, TW;
Yuan-hua Hsu, Taichung, TW;
Shu-fang Chiang, Hsinchu, TW;
Chun-Jen Liao, Taipei, TW;
Yung-chih Wu, Taipei County, TW;
Chen-Chi Tsai, Taipei County, TW;
Hsiang-Ming Huang, Taipei, TW;
Yuan-Hua Hsu, Taichung, TW;
Shu-Fang Chiang, Hsinchu, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A surface modification method of polysaccharide, the modified polysaccharide, and a method of culturing and recovery cells using the same are provided. The surface modification method of polysaccharide comprises (a) immersing a polysaccharide material in an acid, (b) immersing the polysaccharide material in an acidic solution containing a protein, and (c) immersing the polysaccharide material in an alkaline solution containing bivalent metal ions.