The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
Aug. 31, 2007
Steven R. J. Brueck, Albuquerque, NM (US);
Andrew Frauenglass, Albuquerque, NM (US);
Alexander K. Raub, Albuquerque, NM (US);
Dong LI, Albuquerque, NM (US);
Steven R. J. Brueck, Albuquerque, NM (US);
Andrew Frauenglass, Albuquerque, NM (US);
Alexander K. Raub, Albuquerque, NM (US);
Dong Li, Albuquerque, NM (US);
STC.UNM, Albuquerque, NM (US);
Abstract
In accordance with the invention, there are methods for self-aligned spatial frequency doubling in one dimension and also in two dimension. The method for self-aligned spatial frequency doubling in one dimension can include forming a film stack over a substrate, wherein the film stack comprises a photoresist layer and forming a one-dimensional periodic first pattern having a first pitch p on the photoresist layer using an optical exposure, wherein the first pitch p is at least smaller than twice the bandpass limit for optical exposures. The method can also include forming a second pattern using the first pattern by nonlinear processing steps, wherein the second pattern has a second pitch p=p/2.