The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
Jul. 03, 2006
Rene Jabado, Berlin, DE;
Ursus Krüger, Berlin, DE;
Daniel Körtvelyessy, Berlin, DE;
Volkmar Lüthen, Berlin, DE;
Ralph Reiche, Berlin, DE;
Michael Rindler, Schöneiche, DE;
Rene Jabado, Berlin, DE;
Ursus Krüger, Berlin, DE;
Daniel Körtvelyessy, Berlin, DE;
Volkmar Lüthen, Berlin, DE;
Ralph Reiche, Berlin, DE;
Michael Rindler, Schöneiche, DE;
Siemens Aktiegesellschaft, Munich, DE;
Abstract
The invention relates to a method for producing a layer () having nanoparticles (), on a substrate (). The invention is based on the object of specifying a method for producing a layer containing nanoparticles, which method can be carried out particularly easily and nevertheless offers a very wide degree of freedom for the configuration and the composition of the layer to be produced. According to the invention, this object is achieved in that nanoparticles () are released and a nanoparticle stream () is produced in a first process chamber (), the nanoparticle stream () is passed into a second process chamber (), and the nanoparticles () are deposited on the substrate () in the second process chamber ().