The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
May. 23, 2006
Applicants:
Hideo Nakagawa, Shiga, JP;
Masaru Sasago, Osaka, JP;
Tomoyasu Murakami, Osaka, JP;
Inventors:
Assignee:
Panasonic Corporation, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25F 3/00 (2006.01); C03C 25/68 (2006.01); H01L 21/461 (2006.01);
U.S. Cl.
CPC ...
Abstract
A WC substrateis etched by using plasmagenerated from a mixed gas of a gas including a halogen atom and a gas including a nitrogen atom.
Nakagawa, Hideo. (2011). Dry etching method, fine structure formation method, mold and mold fabrication method (U.S. Patent No. 7906030). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7906030
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile