The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7905959 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 15, 2011

Filed:

Nov. 19, 2004
Applicants:

Gwo-chuan Tzu, Sunnyvale, CA (US);

Salvador P. Umotoy, Antioch, CA (US);

Inventors:

Gwo-Chuan Tzu, Sunnyvale, CA (US);

Salvador P. Umotoy, Antioch, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/452 (2006.01); H01L 21/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lid assembly for a semiconductor processing system is provided. The lid assembly generally includes a lid having first and second opposed surfaces, a plurality of controllable flow channels extending from the first and second opposed surfaces and a gas control system disposed on the first surface and operably opening and closing the channels. The gas control system includes a gas manifold disposed on the lid, at least one valve coupled to the gas manifold and adapted to control a flow through one of the flow channels, a reservoir fluidly connected to the gas manifold, and a precursor source fluidly connected to the reservoir.


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Tzu, Gwo-Chuan. (2011). Lid assembly for a processing system to facilitate sequential deposition techniques (U.S. Patent No. 7905959). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7905959

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