The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Mar. 19, 2009
Mark A. Raymond, Littleton, CO (US);
Howard G. Lange, Mount Prospect, IL (US);
Seth Weiss, Cherry Hills Village, CO (US);
Mark A. Raymond, Littleton, CO (US);
Howard G. Lange, Mount Prospect, IL (US);
Seth Weiss, Cherry Hills Village, CO (US);
Genie Lens Technologies, LLC, Englewood, CO (US);
Abstract
A computer-implemented method is provided for optimizing configuration of absorption enhancement structures for use in a photovoltaic enhancement film that is applied onto a PV device to improve absorption. The method includes receiving optimization run input defining a PV enhancement film including defining absorption enhancement structures with differing configurations. The method includes modeling a PV device including PV material such as a silicon thin film. A first ray tracing is performed over a range of incidence angles for the PV device. The method includes determining a set of base path angles for the PV material layer based on this first ray tracing. A second ray tracing is performed for the PV device with the enhancement film, which has absorption enhancement structures. Enhanced path lengths are determined based on the second ray tracking, and path length ratios are determined by comparing the enhanced path lengths to the base path lengths.