The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Mar. 06, 2007
Shi Han, Beijing, CN;
Yu Zou, Beijing, CN;
Ming Chang, Beijing, CN;
Peng Liu, Beijing, CN;
Yi-jian Wu, Beijing, CN;
Lei MA, Beijing, CN;
Frank Soong, Beijing, CN;
Dongmei Zhang, Bellevue, WA (US);
Jian Wang, Beijing, CN;
Shi Han, Beijing, CN;
Yu Zou, Beijing, CN;
Ming Chang, Beijing, CN;
Peng Liu, Beijing, CN;
Yi-Jian Wu, Beijing, CN;
Lei Ma, Beijing, CN;
Frank Soong, Beijing, CN;
Dongmei Zhang, Bellevue, WA (US);
Jian Wang, Beijing, CN;
Microsoft Corporation, Redmond, WA (US);
Abstract
Exemplary methods, systems, and computer-readable media for developing, training and/or using models for online handwriting recognition of characters are described. An exemplary method for building a trainable radical-based HMM for use in character recognition includes defining radical nodes, where a radical node represents a structural element of an character, and defining connection nodes, where a connection node represents a spatial relationship between two or more radicals. Such a method may include determining a number of paths in the radical-based HMM using subsequence direction histogram vector (SDHV) clustering and determining a number of states in the radical-based HMM using curvature scale space-based (CSS) corner detection.