The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2011

Filed:

Jun. 19, 2009
Applicants:

SO Eun Chang, Pohang-si, KR;

Byung Mook Weon, Cambridge, MA (US);

Jung Ho Je, Pohang-si, KR;

Jun Seok Yeom, Pohang-si, KR;

Sei Kwang Hahn, Pohang-si, KR;

Inventors:

So Eun Chang, Pohang-si, KR;

Byung Mook Weon, Cambridge, MA (US);

Jung Ho Je, Pohang-si, KR;

Jun Seok Yeom, Pohang-si, KR;

Sei Kwang Hahn, Pohang-si, KR;

Assignee:

Postech Academy-Industry Foundation, Gyeongsangbuk-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is a method for ablating hyaluronan-based hydrogels with X-rays, the method comprising the steps of: (a) preparing hyaluronan-based hydrogels; and (b) performing X-ray irradiation to the hyaluronan-based hydrogels to induce a degradation of the hyaluronan-based hydrogels by a gel-to-sol transition during the X-ray irradiation. Disclosed is also a method for fabricating three-dimensional microchannels of hyaluronan hydrogels with a finely tunable X-ray ablation technique.


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