The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Jul. 17, 2007
Applicants:
Po-sheng Shih, Taoyuan Hsien, TW;
Seok-lyul Lee, Taoyuan Hsien, TW;
Inventors:
Po-Sheng Shih, Taoyuan Hsien, TW;
Seok-Lyul Lee, Taoyuan Hsien, TW;
Assignee:
Hannstar Display Corporation, Tao-Yuan Hsien, TW;
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1343 (2006.01); G02F 1/136 (2006.01); G02F 1/13 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides a pixel structure and exposure method thereof. This present invention divides these devices that influence the optical characteristic of the pixel region into two parts. Each part is located in a sub-pixel region of the pixel region. Different photolithography process rounds are performed in the different sub-pixel regions.
Quick Actions:
Shih, Po-Sheng. (2011). Pixel structure and exposure method thereof (U.S. Patent No. 7903185). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7903185
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