The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2011

Filed:

Sep. 29, 2007
Applicant:

Chieh-chou Hsu, Hsinchu, TW;

Inventor:

Chieh-Chou Hsu, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
Abstract

A dielectric layer including a film with silicon compound contain oxygen and a film with silicon compound contain nitrogen is provided. A ratio of Si—N group absorption intensity to a thickness of the film with silicon compound contain nitrogen in an FTIR spectrum is substantially greater than or substantially equal to 0.67/μm. The dielectric layer can be incorporated in switch devices.


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