The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Dec. 05, 2006
Ho Seob Kim, Chonan-si, KR;
Seung Joon Ahn, Chonan-si, KR;
Dae Wook Kim, Chonan-si, KR;
Young Chul Kim, Asan-si, KR;
Ho Seob Kim, Chonan-si, KR;
Seung Joon Ahn, Chonan-si, KR;
Dae Wook Kim, Chonan-si, KR;
Young Chul Kim, Asan-si, KR;
Cebt Co. Ltd., Asan-Si, KR;
Abstract
The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to the present invention reduces the spot size of the electron beam when the electron beam reaches a specimen, so that resolution can be increased and the line width of a pattern in a semiconductor lithography process can be reduced, with the result that the performance of the electron can be improved.