The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2011

Filed:

Dec. 02, 2005
Applicants:

Rajesh Kumar, Dracut, MA (US);

Suizhou Yang, Lowell, MA (US);

Ashok L. Cholli, Chelmsford, MA (US);

Inventors:

Rajesh Kumar, Dracut, MA (US);

Suizhou Yang, Lowell, MA (US);

Ashok L. Cholli, Chelmsford, MA (US);

Assignee:

Polnox Corporation, Lowell, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 63/00 (2006.01); C08G 61/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Compounds are synthesized that contain nitrogen and hindered phenol functionalities of an aromatic amine and hindered phenol for use as oxidative stabilizers for organic materials, paints, lubricants, elastomers, and in other applications. The disclosed methods can efficiently synthesize target monomers and polymers without the use of expensive catalysts. Further, the disclosed methods can scale up to industrially useful quantities. In general, the methods provide an improved, highly efficient and economical process for the synthesis of macromonomers having nitrogen containing moiety and sterically hindered phenols and their corresponding polymers.


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