The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Mar. 05, 2010
Joseph Edward Nesakumar, Bangalore, IN;
Ganesh Kannan, Evansville, IN (US);
Vikram Kumar, Tarrytown, NY (US);
Hariharan Ramalingam, Bangalore, IN;
Mark D. Leatherman, Stamford, CT (US);
Suresh K. Rajaraman, Macungie, PA (US);
Joseph Edward Nesakumar, Bangalore, IN;
Ganesh Kannan, Evansville, IN (US);
Vikram Kumar, Tarrytown, NY (US);
Hariharan Ramalingam, Bangalore, IN;
Mark D. Leatherman, Stamford, CT (US);
Suresh K. Rajaraman, Macungie, PA (US);
Momentive Performance Materials Inc., Albany, NY (US);
Abstract
Disclosed herein is a composition comprising a structure (M)(M)(D)(D)(T)(Q), wherein M=RRRSiO; M=RRRSiO; D=RRSiO; D=RRSiO; T=RSiO; and Q=SiO; wherein each Ris independently a monovalent hydrocarbon radical containing an epoxy group; Rcomprises a structure -L-Si(R)(OR)or L(D)(M)-L-Si(R)(OR), wherein L, L, and Lare independently divalent linking groups; g and g' independently have a value from 0 to 2; M=RRRSiO; D=RRSiO; wherein R, R, R, R, R, R, R, R, R, R, R, R, R, R, R, R, R, and Rare independently monovalent hydrocarbon radicals; wherein a, b, c, d, e, f, h, and i are stoichiometric subscripts that are zero or positive subject to the following limitations: b has a value of 2; d is greater than or equal to 1; when (a+c+e+f) is equal to zero, (b+d) is greater than or equal to 3; and when i=0, h is at least 1.