The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Nov. 02, 2007
Method for fabricating a fin-shaped semiconductor structure and a fin-shaped semiconductor structure
Applicants:
Chris Stapelmann, Tervuren, BE;
Thomas Schulz, Heverlee, BE;
Inventors:
Chris Stapelmann, Tervuren, BE;
Thomas Schulz, Heverlee, BE;
Assignee:
Infineon Technologies AG, Neubiberg, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A fin-shaped structure is formed from a semiconductor material. The fin-shaped structure is processed to generate a tensile strain within the semiconductor material along a longitudinal direction of the fin.