The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Oct. 27, 2009
Ryota Kato, Yokohama, JP;
Yoshitomo Marumoto, Yokohama, JP;
Hitoshi Tsuboi, Kawasaki, JP;
Eri Noguchi, Yokohama, JP;
Takeshi Egami, Tokyo, JP;
Ryota Kato, Yokohama, JP;
Yoshitomo Marumoto, Yokohama, JP;
Hitoshi Tsuboi, Kawasaki, JP;
Eri Noguchi, Yokohama, JP;
Takeshi Egami, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
The print permitting ratios of the masks in the first to fourth passes of a C ink are respectively 6.2%, 37.5%, 37.5%, and 18.8%. On the other hand, the print permitting ratios of the masks in the first to fourth passes of an M ink are respectively 12.5%, 37.5%, 37.5%, and 12.5%. In this way, the respective masks are set such that a larger amount of the C ink is applied in a later pass as compared with the M ink. Thereby, it is possible to reduce an amount of the M ink to be applied later with respect to the C ink functioning to 'reduce a permeation speed of an ink applied later by filling,' and it is possible to prevent a permeation speed from slowing down overall. As a result, it is possible to prevent the occurrence of beading due to a time to complete permeation becoming longer.