The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Feb. 07, 2008
Tsuyoshi Asahi, Takatsuki, JP;
Hiroshi Masuhara, Higashiosaka, JP;
Teruki Sugiyama, koube, JP;
Isamu OH, Osaka, JP;
Sen-ichi Ryo, Osaka, JP;
Tsuyoshi Asahi, Takatsuki, JP;
Hiroshi Masuhara, Higashiosaka, JP;
Teruki Sugiyama, koube, JP;
Isamu Oh, Osaka, JP;
Sen-ichi Ryo, Osaka, JP;
ABsize, Inc., Osaka-shi, Osaka, JP;
Abstract
The present invention provides a fullerene suspension and a method for producing a fullerene suspension having high dispersion stability without any chemical compound. Also, the fullerene suspension and its producing method makes it possible to be applied in various fields including the field of medical and pharmaceutical science and the field of foods and environment, in which the fullerene suspension obtained by the prior methods had not been applied. The fullerene is ground to form nanoparticles by irradiating a fullerene in a poor solvent with a laser. The pulse laser having a width of several-ten femtoseconds to several-hundred nanoseconds is appropriately applied.