The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Dec. 04, 2007
Applicants:
Qing Dai, San Jose, CA (US);
Bruno Marchon, Palo Alto, CA (US);
Tsai-wei Wu, San Jose, CA (US);
Inventors:
Assignee:
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 21/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
The true roughness of highly granular perpendicular media is measured by forming an inverse replica of the surface of the media. The invention enables AFM measurements of granular media valley depth to more consistently predict the corrosion performance of the media. A liquid resist is used to first replicate the media topography and form the inverse replica. The narrow valleys in the original media are precisely modeled as sharp peaks on the replica. The height of the peaks are readily measured with an AFM tip. The resulting image is a negative of the original surface.