The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
Sep. 28, 2006
Chung-ho Huang, San Jose, CA (US);
Jackie Seto, Mountain View, CA (US);
Nicolas Bright, San Jose, CA (US);
Chung-Ho Huang, San Jose, CA (US);
Jackie Seto, Mountain View, CA (US);
Nicolas Bright, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
In a plasma processing system, a method for dynamically establishing a baseline is provided. The method includes processing a first substrate. The method also includes collecting a first signal data for the first substrate. The method further includes comparing the first signal data against the baseline. The method moreover includes including the first signal data in a recalculation of the baseline if the first signal data is within a confidence level range, which is in between a top level above the baseline and a bottom level below the baseline.