The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
Jan. 11, 2008
Kensuke Masuda, Kodaira, JP;
Yukio Itami, Yokohama, JP;
Hisashi Inada, Isehara, JP;
Kiyofumi Arai, Ebina, JP;
Takeshi Kikuchi, Miyagi, JP;
Yoshihiro Takahashi, Miyagi, JP;
Tomotaka Takamura, Miyagi, JP;
Kensuke Masuda, Kodaira, JP;
Yukio Itami, Yokohama, JP;
Hisashi Inada, Isehara, JP;
Kiyofumi Arai, Ebina, JP;
Takeshi Kikuchi, Miyagi, JP;
Yoshihiro Takahashi, Miyagi, JP;
Tomotaka Takamura, Miyagi, JP;
Ricoh Company, Ltd., Tokyo, JP;
Abstract
In the optical deflector, the mean width of profile elements of a cross section of the deflection surface in the sub scan direction is set to be less than the spacing between spots of the light beams formed in the sub scan direction of the deflection surface. This makes it possible to prevent a variation in the size and shape of the spots of the light beams deflected by the deflection surface due to the undulation (unevenness) of the deflection surface. As a result, it is able to suppress a decrease of the granularity of images and form images with high quality.