The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
Jul. 22, 2005
Jochen Strahle, Weissach, DE;
Jochen Strahle, Weissach, DE;
Robert Bosch GmbH, Stuttgart, DE;
Abstract
An interferometric measuring device for measuring a measured object, in particular for thickness measurement of the measured object. A special-purpose objective having a mirror system is provided, which includes at least one first deflection mirror and one second deflection mirror and in which these are situated in such a way that the object beams incident on the first deflection mirror or on the second deflection mirror are directed respectively onto a first side or a second side, which is parallel thereto, of the measured object to be measured in a first beam path or a second beam path, respectively, which are antiparallel to one another. The mirror system additionally has at least one first position mirror for imaging the position of the measured object to be measured in relation to the first deflection mirror and/or the second deflection mirror.