The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
Jan. 05, 2007
Bradley Hunter, Lexington, MA (US);
Bradley Hunter, Lexington, MA (US);
Active Precision, Inc., Burlington, MA (US);
Abstract
A mechanism for manipulation of a substrate over a substantially planar region has at least three, and up to six, degrees of freedom (DOF). The mechanism may be manufactured in various configurations, including triangular, and may use inherent symmetry to reduce the number of distinct components that must be manufactured. The mechanism may use parallelism to reduce the moving mass and thereby achieve higher levels of performance using less expensive motors while dissipating less power.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile