The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2011

Filed:

Apr. 17, 2008
Applicants:

Wu-chieh Liu, Keelung, TW;

Chin-poh Pang, Hsinchu, TW;

Chi-xiang Tseng, Hsinchu, TW;

Cheng-lin Yang, Hsinchu, TW;

Inventors:

Wu-Chieh Liu, Keelung, TW;

Chin-Poh Pang, Hsinchu, TW;

Chi-Xiang Tseng, Hsinchu, TW;

Cheng-Lin Yang, Hsinchu, TW;

Assignee:

VisEra Technologies Company Limited, Hsinchu Science Park, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/0232 (2006.01); H01L 27/146 (2006.01); H01L 33/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A microlens array is provided, including a base layer with a plurality of first microlenses formed over a first region thereof, wherein the first microlenses are formed with a first height. A plurality of second microlenses are formed over a second region of the base layer, wherein the second region surrounds the first region and the second microlenses are formed with a second height lower than the first height. A plurality of third microlenses are formed over a third region of the base layer, wherein the third region surrounds the second and three regions, and the microlenses are formed with a third height lower than the first and second heights.


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