The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
Mar. 19, 2008
Yukio Taniguchi, Yokohama, JP;
Masakiyo Matsumura, Kamakura, JP;
Kazufumi Azuma, Yokohama, JP;
Tomoya Kato, Yokohama, JP;
Takahiko Endo, Yokohama, JP;
Yukio Taniguchi, Yokohama, JP;
Masakiyo Matsumura, Kamakura, JP;
Kazufumi Azuma, Yokohama, JP;
Tomoya Kato, Yokohama, JP;
Takahiko Endo, Yokohama, JP;
Advanced LCD Technologies Development Center Co., Ltd., Yokohama-shi, JP;
Abstract
A crystallization apparatus includes a light modulation element, and an image forming optical system that forms a light intensity distribution set based on light transmitted through the light modulation element on an irradiation surface. The crystallization apparatus irradiates a non-single crystal semiconductor film with light having the light intensity distribution to generate a crystallized semiconductor film. A curvature radius of at least one isointensity line of a light intensity substantially varies along the isointensity line in the light intensity distribution on the irradiation surface, and a curvature radius of at least a part of the isointensity line has a minimum value of 0.3 μm or below.