The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7897910 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 01, 2011

Filed:

Feb. 09, 2009
Applicants:

Yohai Roichman, New York, NY (US);

David G. Grier, New York, NY (US);

Ilias Cholis, New York, NY (US);

Inventors:

Yohai Roichman, New York, NY (US);

David G. Grier, New York, NY (US);

Ilias Cholis, New York, NY (US);

Assignee:

New York University, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/00 (2006.01); G02B 27/00 (2006.01); G01J 1/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and system for establishing extended optical traps for commercial use. The method and system employs a diffractive optical element (DOE) to process a light beam wherein the DOE includes phase information and amplitude information to create the extended optical trap. Such extended traps can be line traps and can be further expanded to two and three dimensional configurations.


Find Patent Forward Citations

Roichman, Yohai. (2011). System for characterizing a light field (U.S. Patent No. 7897910). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7897910

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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