The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
Mar. 01, 2007
Yoshitaka Hayashi, Yokohama, JP;
Noboru Sasa, Kawasaki, JP;
Toshishige Fujii, Yokohama, JP;
Masayuki Fujiwara, Yokohama, JP;
Hiroshi Miura, Sendai, JP;
Masaki Kato, Sagamihara, JP;
Takeshi Kibe, Isehara, JP;
Shinya Narumi, Yokohama, JP;
Yoshitaka Hayashi, Yokohama, JP;
Noboru Sasa, Kawasaki, JP;
Toshishige Fujii, Yokohama, JP;
Masayuki Fujiwara, Yokohama, JP;
Hiroshi Miura, Sendai, JP;
Masaki Kato, Sagamihara, JP;
Takeshi Kibe, Isehara, JP;
Shinya Narumi, Yokohama, JP;
Ricoh Company, Ltd., Tokyo, JP;
Abstract
To provide a sputtering target for preparing a recordable optical recording medium characterized by comprising Bi and B and a manufacturing method thereof, a recordable high density optical recording medium using the sputtering target, and a sputtering target which is capable of improving a speed of the film formation for the improvement of productivity, which has a high intensity at the time of the film formation and which has a heightened packing density.