The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
May. 05, 2006
Laurent Pain, Saint Nicolas de Macherin, FR;
Serdar Manakli, Grenoble, FR;
Georges Bervin, Clermont-Ferrand, FR;
Laurent Pain, Saint Nicolas de Macherin, FR;
Serdar Manakli, Grenoble, FR;
Georges Bervin, Clermont-Ferrand, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Freescale Semiconductor, Inc., Austin, TX (US);
Abstract
A method for transferring a predetermined pattern onto a flat support performed by direct writing by means of a particle beam comprises at least: deposition of a photoresist layer on a free surface of the support, application of the beam on exposed areas of the photoresist layer, performing correction by modulation of exposure doses received by each exposed area, developing of the photoresist layer so as to form said pattern. Correction further comprises determination of a substitution pattern () comprising at least one subresolution feature and use of the substitution pattern () for determining the areas to be exposed when the electron beam is applied. In addition, modulation takes account of the density of the substitution pattern () near to each exposed area.