The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
Jun. 12, 2008
Applicant:
Kyosuke Deguchi, Yokohama, JP;
Inventor:
Kyosuke Deguchi, Yokohama, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A technique for forming fine patterns by a simple method. A fine pattern forming method includes a step of forming a heat-resist film on a substrate, applying energy to regions of the resist film to form a fine pattern, and thereafter developing the resist film. The material used to form the resist film is a metal oxide of a composition that differs from a stoichiometric composition by lacking a small amount of oxygen, the energy is applied to the resist film using pressure, and the resist film is developed using an alkaline developer.