The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2011

Filed:

Apr. 12, 2006
Applicants:

Prasad T. S. Raghavendra, Bangalore, IN;

Yu-gene T. Chen, Glendale, AZ (US);

Inventors:

Prasad T. S. Raghavendra, Bangalore, IN;

Yu-Gene T. Chen, Glendale, AZ (US);

Assignee:

Honeywell International Inc., Morristown, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04J 3/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process control system includes at least one controller and at least one wireless valve element capable of being controlled by the at least one controller. The process control system also includes a first transceiver configured to communicate with the at least one wireless valve element and a second transceiver configured to communicate wirelessly with the first transceiver. The second transceiver is further configured to communicate with the at least one controller.


Find Patent Forward Citations

Raghavendra, Prasad T. S.. (2011). System and method for monitoring valve status and performance in a process control system (U.S. Patent No. 7894473). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7894473

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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