The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Jul. 20, 2007
Sébastien Rosel, Gif-sur-Yvette, FR;
Jean-mare Chauvet, Meyreuil, FR;
Christophe Dufaut, Marseilles, FR;
Yannick Wargniez, Paris, FR;
Sébastien Rosel, Gif-sur-Yvette, FR;
Jean-Mare Chauvet, Meyreuil, FR;
Christophe Dufaut, Marseilles, FR;
Yannick Wargniez, Paris, FR;
Dassault Systemes, Suresnes, Cedex, FR;
Abstract
The invention is directed to a method for creating a parametric surface symmetric with respect to a given symmetry operation (). The invention method: (i) identifies a mesh pattern (); (ii) creates a base mesh () from the mesh pattern, according to a symmetry operation; (iii) subdivides the base mesh, at a given order, into a subdivided mesh defining elementary faces; and (iv) forms the parametric surface () according to said faces. The base mesh is symmetric with respect to the symmetry operation such as a reflection symmetry. The invention further concerns computer program product and systems implementing the method according to the invention.