The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Nov. 14, 2002
Andreas Kaiser, Villeneuve d'Ascq, FR;
Dimitri Galayko, Lille, FR;
Dominique Collard, Lambersart, FR;
Andreas Kaiser, Villeneuve d'Ascq, FR;
Dimitri Galayko, Lille, FR;
Dominique Collard, Lambersart, FR;
Abstract
The invention concerns a method for adjusting the operating gap of two mechanical elements of a substantially planar mechanical structure obtained by micro-etching. The method consists in attributing (A) to one of the elements (E) a fixed reference position (RF) in the direction of the residual gap separating said elements; connecting (C) the other element (OE) to the fixed reference position (RF) by an elastic link (S) and installing (D) between the fixed reference position (RF) and the other element (OE) at least a stop block defining an abutting gap, maximum displacement amplitude of the other element; subjecting (DE) the other element (OE) to a displacement antagonistic to the elastic link (S) up to the abutting position constituting the operating position, the residual gap being reduced to the difference between residual gap and abutting gap and less than the resolution of the micro-etching process. The invention is applicable to electromechanical resonators.