The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Dec. 12, 2008
Masanori Tsutsumi, Kawasaki, JP;
Jusuke Ogura, Kawasaki, JP;
Masanori Tsutsumi, Kawasaki, JP;
Jusuke Ogura, Kawasaki, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
A method of manufacturing a semiconductor device has forming a first nitride layer over a substrate, forming a first oxide layer on the first nitride layer, forming a second nitride layer on the first oxide layer, forming a photoresist layer over the second nitride layer, forming a opening in the photoresist layer, etching the second nitride layer using the photoresist layer as a mask such that the opening is reached to the first oxide layer, etching the first oxide layer using the second nitride layer as a mask such that the opening is reached to the first nitride layer, etching the first oxide layer such that bottom zone of the opening is increased in diameter, and etching the first nitride layer using the first oxide layer as a mask such that the opening is reached to the substrate thereby to form contact hole reaching to the substrate.