The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
May. 26, 2005
Peng Yao, Newark, DE (US);
Dennis W. Prather, Newark, DE (US);
Peng Yao, Newark, DE (US);
Dennis W. Prather, Newark, DE (US);
University of Delaware, Newark, DE (US);
Abstract
A method and article of manufacture for three-dimensional structures having micron dimensions includes coating a substrate with layers of photo resist. Each layer of photo resist is exposed with its own two-dimensional mask defining one slice of an object. Subsequent layers of photo resist are exposed with different patterns. Once all layers have been fabricated and exposed to identify two-dimensional features for the layer, the multiple layers are developed to removed photo resist which has not been exposed. The layered structure represents a three-dimensional object where the depth dimension is defined by the photo resist layer thickness. By decreasing the wavelength of the light exposure, it is possible to confine exposure to a single layer of photo resist.